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  • EM-KLEEN etc remote plasma cleaner for SEM, FIB, XPS etc Model:EM-KLEEN / SEMI-KLEEN quartz / SEMI-KLEEN sapphire
    PIE downstream plasma cleaners include EM KLEEN plasma cleaner and SEMI KLEEN/SEMI KLEEN quartz/SEMI KLEEN sapphire plasma cleaners. EM KLEEN remote plasma cleaner can be used to clean samples and chambers for electron microscopes and other type analytical instruments, such SEM, FIB, TEM, XPS and SIMS. It consists of a resistive LCD touchscreen controller with embedded microcomputer and a remote plasma source. Remote plasma source should be installed on the vacuum chamber to be cleaned. Standard vacuum interface port is NW/KF40 flange. Adapters for different SEM port are available. CF2.75" flange options is also available. SEMI KLEEN and EM KLEEN series remote plasma cleaners were based on the high efficiency inductively coupled plasma (ICP) discharge technology developed at the Lawrence Berk​eley National Lab. Our patent pending Turbo Di​scharge technology further improves the plasma strength by as much as 3X compared with traditional ICP discharge technology.

Introduction
Relevant

PIE downstream plasma cleaners include EM KLEEN plasma cleaner and SEMI KLEEN plasma cleaner(SEMI KLEEN quartz / SEMI KLEEN sapphire). 


EM-KLEEN remote plasma cleaner SEM, FIB, XPS, SIMS, AES systems.

Small, yet smart and powerful downstream plasma cleaners


EM-KLEEN remote plasma cleaner can be used to clean samples and chambers for electron microscopes and other type analytical instruments, such SEM, FIB, TEM, XPS and SIMS. It consists of a resistive LCD touchscreen controller with embedded microcomputer and a remote plasma source. Remote plasma source should be installed on the vacuum chamber to be cleaned. Standard vacuum interface port is NW/KF40 flange. Adapters for different SEM port are available. CF2.75" flange options is also available.

Despite its small size, EM-KLEEN remote plasma source has integrated a pirani pressure sensor, an automatic gas flow controller, a plasma strength sensor, a temperature sensor and a cooling fan. It can easily be pumped down to low 10-7 Torr vacuum. Flow controller automatically adjust gas flow rate to maintain user specified pressure inside the plasma cleaner chamber. Miniature pressure sensor constantly monitors the sample chamber pressure. It can be used as a safety interlock trigger in safe operation mode and to count sample loading events for SmartSchedule™ feature. Cooling fan enables high-power high-speed cleaning without causing source overheat. Temperature sensor provides another interlock protection against source overheat during prolonged cleaning at high power. Plasma strength sensor measures the plasma strength in realtime, users are not blind to plasma status anymore.

With pressure sensor, automatic gas flow controller, plasma sensor, temperature sensor and LCD touchscreen controller with embedded microprocessor working in tandem, EM-KLEEN plasma cleaner can take care of your system automatically and provide protection against potential user mistakes. SmartClean™ technology developed by PIE Scientific combines the state-of-the-art plasma source design technology in nuclear research and in semiconductor industry. EM-KLEEN plasma cleaners are far more advanced than previous generations of remote plasma cleaners. Our plasma cleaner can beat competitors on any specification. In addition, many unique features are only available on our product.


Feature list:

  • Low pressure high efficiency plasma discharge technology originated from the research work carried out in the Lawrence Berkeley National Laboratory
  • Instant plasma ignition at extremely low pressure. User never needs to worry about whether plasma ignites or not.
  • Electronic gas flow control with pressure sensor feedback control. User can directly specify different source operating pressure. Plasma cleaner will maintain the set pressure by automatically adjusting gas flow through a servo feedback control loop provided by the pressure sensor.
  • Plasma probe monitors the plasma strength to guide user to setup optimal recipe. Optimal gas flow can vary with different system pumping speed and chamber size. Our plasma cleaner gives user the freedom to change gas flow electronically and optimize the source pressure based on the feedback from the plasma strength probe.
  • 75Watt rf power at 13.56MHz.
  • Microcomputer with touchscreen user interface.
  • Intuitive remote PC control user interface through RS232/RS485 protocol.
  • Intelligent "Safe operation mode" and "Expert operation mode" with user customizable warning message. Very useful feature if the electron or ion microscope is shared by many inexperienced users.
  • Customizable SmartScheule function on the microcomputer can take care of your system autonomously.
  • Support 60 customizable recipes.
  • Active fan cooling for high power high speed cleaning
  • Overtemperature interlock protection.
  • Easy to carry controller. System can be easily moved between different systems.



SEMI-KLEEN downstream plasma cleaner

Contamination removal solution for semiconductor capital equipment

SEMI-KLEEN remote plasma cleaner is designed to meet the tough requirements from semiconductor industry. It can be used on electron beam review system (EBR), electron beam inspection system (EBI), CD-SEM, electron beam lithography system, EUV lithography (EUVL) and EUV mask inspectors. Besides all the standard hardware features on EM-KLEEN plasma cleaners, such as pressure sensor, automatic gas flow controller, plasma strength sensor, temperature sensor, cooling fan and LCD touchscreen controller, SEMI-KLEEN plasma cleaner also integrates the latest plasma source design technologies from semiconductor industry to reduce particle generation risk. Low particulate design on SEMI-KLEEN plasma cleaner has been qualified by semiconductor capital equipment manufacturers and it outperforms competition by multiple orders of magnitude. Standard SEMI-KLEEN plasma cleaner uses high purity quartz tube with external antennas. It can be used to generate air, O2, Ar+O2, H2 and Ar+H2 plasma at low pressure. Proprietary antenna design reduces plasma potential, thus reducing ion sputtering on the source chamber. In addition, chamber materials have been carefully selected to withstand plasma etching. Combined with proprietary dual stage particle filtering technology, SEMI-KLEEN plasma cleaner can meet the toughest PWP requirement from customers like Intel, Samsung and TSMC.


Feature list:

  • Dual stage particle filtering technology that can remove almost all the particles larger than 3nm.
  • Low particulate high reliability plasma source design technology for semiconductor industry.
  • Option to support automatic RF impedance matching.
  • Instant plasma ignition at extremely low pressure. User never needs to worry about whether plasma ignites or not.
  • Electronic gas flow control with pressure sensor feedback control. User can directly specify different source operating pressure. Plasma cleaner will maintain the set pressure by automatically adjusting gas flow through a servo feedback control loop provided by the pressure sensor.
  • Plasma probe monitors the plasma strength to guide user setup optimal recipe. Optimal gas flow can vary with different system pumping speed and chamber size. Our plasma cleaner gives user the freedom to change gas flow electronically and optimize the source pressure based on the feedback from the plasma strength probe.
  • Microcomputer with touchscreen user interface.
  • Intuitive remote PC control user interface through RS232/RS485 protocol.
  • Customizable SmartScheule function on the microcomputer can take care of your system autonomously.
  • Support 60 customizable recipes.
  • Active fan cooling for high power high speed cleaning
  • Overtemperature interlock protection.



SEMI-KLEEN sapphire plasma cleaner

Remote plasma source for agggresive and corrosive gases

SEMI-KLEEN sapphire remote plasma cleaner is an upgrade over standard SEMI-KLEEN plasma cleaner to support aggressive and corrosive process gases. Plasma chamber has been replaced with more chemcially resistant sapphire tube. Vacuum seal design and chamber material selection have been optimized to support corrosive radicals inside the plasma. For applications that hydrogen plasma etching of quartz chamber is a concern, SEMI-KLEEN sapphire is a better choice over traditional quartz chamber hydrogen plasma source.

SEMI-KLEEN sapphire remote plasma source has been used to deposit thin films, clean samples surface prior to thin film deposition in atomic layer deposition systems and clean carbon and oxygen contaminations from metal surface for projects carried out in NIST. Customer results show that SEMI-KLEEN plasma source can clean carbon and oxygen contaminants from InGaAs sample with just 2 second hydrogen plasma. Highly efficient hydrogen plasma source requies low pressure discharge capability. Otherwise, atomic hydrogen will recombine and lose its effectiveness.



 


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