The
K500X System uses a Magnetron Target Assembly which improves the
efficiency, and gives a Fine Grain and Cool Sputtering, using low
voltages.
Note: The K500X is a manual version of the K550X without
rotating stage.
The
K550X employs a Rotating Specimen Stage which can also be tilted and
accommodates a range of specimens and stubs. With Fully Automatic Control
and pre-selectable parameters, the K550X gives repeatable thin film
thickness depositions.
The
three magnetron target assemblies in the K650X are positioned to give an
even deposition coating over a large diameter. This method allows standard
targets to be utilised. The triple sputter system is particularly useful
in the Semiconductor Wafer Industry.
The
K575X uses a 'Turbo' pump, backed by a Rotary Vacuum pump. The vacuum can
be adjusted to suit conditions for Chromium or Gold targets and the
sputter head is Peltier Cooled to give high performance, fine grain
coatings.
The
K675X with twin gear rotating sample stage gives a progressive elliptical
rotation for even sputtering desposition. Complete 8 inch (200mm) wafers
can be coated. The multi-target system is particularly useful for the
semi-conductor wafer industry.
The
SC3000 Sputtering Coater System can coat complete 12 inch (300mm) wafers.
Three sequential coatings can be achieved without breaking vacuum,
offering multi-target sputtering. This high vacuum, high resolution
coating system gives fine, and precise reproducible coatings
The
K450X uses several Carbon Fibre types to cover a range of deposition
thicknesses operating at rotary vacuum pressures. The coater employs low
voltage, high current, electrodes between which the carbon fibre is
located and causes the carbon to burn quickly or 'Flash' the fibre fusing
as part of the process.
The
K950X High Vacuum Evaporator gives continuous carbon films using carbon
rod evaporation. The carbon rods are shaped to achieve high current
density with sufficient temperature to cause evaporation. It can be used
for support films and replicas in TEM and X-Ray analysis, and thin film
coatings for SEM.
The
K975X Thin Film Evaporator System enables a range of preparation
techniques to be applied with flexibility. It allows for Carbon
Evaporation and Metal Evaporation, together with a Sputter Coating option.
A range of techniques can be practiced including carbon support films and
replicas for TEM, low angle shadowing and sequential layer coatings using
dual source evaporation.
A
'self contained' preparation system, with a turbo molecular, high vacuum
pumping unit to allow the freezing, preparation, transferring, and
subsequent examination of frozen hydrated specimens in a Scanning Electron
Microscope.
The K850 Critical Point Dryer for SEM, AFM & TEM Specimen Preparation
The
K850 Critical Point Dryer is ideal for the drying or preparation of
Biological Specimens, avoiding the damaging effects of surface tension.
The K850 ensures that the critical point is accurately obtained.
The K1050X Plasma Treatment Unit with RF Generator
The
K1050X Plasma Treatment Unit consists of a solid state RF generator and
associated tuning circuits, and employs an Oxygen/Argon mix of gases, the
Oxygen removing the hydrocarbons and the Argon giving a surface etching of
the samples.
The K750X Freeze Dryer with Peltier Cooling
The
K750 Freeze Dryer, with 'peltier' thermoelectric stage, and drying
temperatures of the order of -60oC, with back-up water cooling
at a nominal 15oC. Disposable desiccant containers located in
the preparation chamber enhance water vapour removal.
The
K775 Turbo Freeze Dryer operates at temperatures down -140oC
and employs a turbomolecular pumping unit, backed by a rotary vacuum pump.
Lower temperatures are achieved by using a liquid nitrogen fed cold stage
Environmental, Variable Pressure SEM Cooling Stage
Peltier
Driven Cooling Stage for ESEM, VP, EP and SEM, with secondary cooling via
a liquid cooling circuit and available for any Hitachi, Leo, Joel, FEI SEM
and other SEM vendors.
The
K100X Glow Discharge system in the DC+ Mode, can draw up 1.5Kv. allowing
ion etching of the specimen surface to remove oxide or resist layers.
Polarity of can be changed for Carbon Film Surface Treatment or Surface
Etching of Metallic Specimens.
Precision
engineered pumps, ideal choice for a wide range of applications and
environments, together with low noise levels. Pumps include 2 Stage
Rotary, 3 Stage Diaphragm and Scroll Pumps.
The
K250 uses several Carbon Fibre types to cover a range of deposition
thicknesses operating at Rotary Vacuum pressures utilising the chamber of
the Sputter Coater. Coating is omni-directional, and has a relatively
short cycle time of the order of 5 minutes.
The
K150 consists of a Control Unit external to the Instrument and a Crystal
Holder with an Interconnection Lead and Pre-Amplifier. In addition, it has
a vacuum collar to suit the appropriate Instrument Chamber.
The
K350 Glow Discharge system in the DC+ Mode, can draw up 1.5Kv. allowing
ion etching of the specimen surface to remove oxide or resist layers.
Polarity of can be changed for Carbon Film Surface Treatment or Surface
Etching of Metallic Specimens.